Structure characterization of plasma-deposited TiN coatings
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference6 articles.
1. Proc. 10th Int. Conf. on Chemical Vapor Deposition;Shizhi,1987
2. Plasma‐assisted chemical vapor deposition of titanium nitride in a capacitively coupled radio‐frequency discharge
3. Physics and Chemistry of Protective Coatings;Sproul,1985
4. The deposition rate and properties of the deposit in plasma enhanced chemical vapor deposition of TiN
5. Composition, morphology and mechanical properties of plasma-assisted chemically vapor-deposited TiN films on M2 tool steel
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2. Depth-resolved X-ray residual stress analysis in PVD (Ti, Cr) N hard coatings;International Journal of Materials Research;2003-06-01
3. Binary nitride and oxynitride PVD coatings on titanium for biomedical applications;Surface and Coatings Technology;2001-12
4. Influence of the interface preparation on properties of PECVD TiN;Surface and Coatings Technology;1999-09
5. Plasma assisted CVD for low temperature coatings to improve the wear and corrosion resistance;Surface and Coatings Technology;1996-12
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