Ion flux characteristics in arc vapor deposition of TiN-Reference-Cited by-同舟云学术

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Ion flux characteristics in arc vapor deposition of TiN

Published:1988-12 Issue:1-2 Volume:36 Page:243-255
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Bergman Clark

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference14 articles.

1. Cathode spot erosion and ionization phenomena in the transition from vacuum to atmospheric pressure arcs

2. Analysis of the Electrode Products Emitted by dc Arcs in a Vacuum Ambient

3. Cathodic arc deposition technology

4. Ion Plating and Implantation;Bergman,1986

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1. Optical emission spectroscopy of vanadium cathodic arc plasma at different nitrogen pressure;Journal of Applied Physics;2023-12-22

2. Dependence of Arc Ion plating process on properties of CrAl coating for ATF cladding: Effect of bias voltage and targets;Journal of Nuclear Materials;2023-10

3. Recent Developments and Applications of TiN-Based Films Synthesized by Magnetron Sputtering;Journal of Materials Engineering and Performance;2023-05-24

4. Influence of deposition conditions on microstructure and texture of Ti1-xAlxN PVD coatings;NANOCON Conference Proeedings;2023

5. Determination of Local Residual Stress on Post-Treated TiAlN-Coated Tungsten Carbide Tools;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2022-08

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