Current industrial practices — technical note: High throughput metal-ion implantation system-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Current industrial practices — technical note: High throughput metal-ion implantation system

Published:1990-06 Issue:3 Volume:41 Page:389-398
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Gehman B.L.,Magnuson G.D.,Tooker J.F.,Treglio J.R.,Williams J.P.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference11 articles.

1. High current ion source

2. Transport and acceleration of high current uranium ion beams

3. Status of the MEVVA high current metal ion source;Brown,1987

4. Plasma expansion as a cause of metal displacement in vacuum‐arc cathode spots

5. Measurements of vacuum arc ion charge state distributions;Brown,1988

Cited by 19 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Arc Vapor Deposition;Handbook of Physical Vapor Deposition (PVD) Processing;2010

2. Atomistic Film Growth and Some Growth-Related Film Properties;Handbook of Physical Vapor Deposition (PVD) Processing;1998

3. Ion Plating and Ion Beam Assisted Deposition;Handbook of Physical Vapor Deposition (PVD) Processing;1998

4. Arc Vapor Deposition;Handbook of Physical Vapor Deposition (PVD) Processing;1998

5. The Low-Pressure Plasma Processing Environment;Handbook of Physical Vapor Deposition (PVD) Processing;1998

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP