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Fabrication of aluminum oxide films with high deposition rates using the activated reactive evaporation technique

  • Published:1990-12 Issue: Volume:43-44 Page:213-222
  • ISSN:0257-8972
  • Container-title:Surface and Coatings Technology
  • language:en
  • Short-container-title:Surface and Coatings Technology

Author:

Yoon J.S.,Potwin G.F.,Doerr H.J.,Deshpanday C.V.,Bunshah R.F.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. ALUMINUM OXIDE FILMS FABRICATED BY REACTIVE ELECTRON-BEAM EVAPORATION IN THE FORE-VACUUM PRESSURE RANGE;High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes;2024

2. Evaporation;Handbook of Deposition Technologies for Films and Coatings;2010

3. Corrosion protection ability of Al2O3 coatings deposited with ion beam assisted deposition;Surface and Coatings Technology;1997-02

4. The effect of residual stress on the adhesion of PECVD-coated aluminum oxide film on glass;Thin Solid Films;1996-09

5. Plasma chemical vapour deposition of aluminium oxide on hardmetals;International Journal of Refractory Metals and Hard Materials;1996-01
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