ALUMINUM OXIDE FILMS FABRICATED BY REACTIVE ELECTRON-BEAM EVAPORATION IN THE FORE-VACUUM PRESSURE RANGE-Reference-Cited by-同舟云学术

ALUMINUM OXIDE FILMS FABRICATED BY REACTIVE ELECTRON-BEAM EVAPORATION IN THE FORE-VACUUM PRESSURE RANGE

Published:2024 Issue:1 Volume:28 Page:1-8
ISSN:1093-3611
Container-title:High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
language:en
Short-container-title:High Temp Mat Proc

Author:

Burdovitsin Victor A.,Karpov K. I.,Kiki L.J. Ngon A.,Oks Efim M.

Abstract

We have investigated the formation features and measured the electrical and optical parameters of aluminum oxide films fabricated by electron-beam evaporation in oxygen in the range of elevated fore-vacuum pressures. On the basis of the proposed physical model and numerical estimates, a consistent explanation of experimental dependences is given.

Publisher

Begell House

Subject

Physical and Theoretical Chemistry,Spectroscopy,General Engineering,Energy Engineering and Power Technology,Condensed Matter Physics,General Materials Science

Link

https://www.dl.begellhouse.com/download/article/4ef96ba705f9bca4/HTM-48009.pdf

Reference16 articles.

1. Abdel Haleem, A.M. and Ichimura, M., Electrochemical Deposition of Aluminum Oxide Thin Films from Aqueous Baths, Mater. Lett., vol. 130, no. 1, pp. 26-28, 2014.

2. Bakeev, I.Yu., Burachevsky, Yu.A., and Yushkov, Yu.G., Creating Ceramic Electrically Insulating Coating on Metal Surface, J. Phys.: Conf. Ser., vol. 1393, p. 012074, 2019.

3. Brewer, L. and Searcy, A.W., The Gaseous Species of the Al-Al2O3 System, J. Am. Chem. Soc., vol. 73, no. 11, pp. 5308-5314, 1951.

4. Burdovitsin, V.A. and Oks, E.M., Fore-Vacuum Plasma-Cathode Electron Sources, Laser Part. Beams, vol. 26, no. 4, pp. 619-635, 2008.

5. Cohen, E.R., David, R.L., and George, L.T., AlP Physics Desk Reference, 3rd edition. New York: Springer-Verlag, 2003.