Photoconductive measurements on microwave-assisted plasma-enhanced chemically vapor deposited diamond films-Reference-Cited by-同舟云学术

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Photoconductive measurements on microwave-assisted plasma-enhanced chemically vapor deposited diamond films

Published:1991-08 Issue:1-3 Volume:47 Page:356-364
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Pan L.S.,Kania D.R.,Pianetta P.,Landstrass M.,Landen O.L.,Plano L.S.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference16 articles.

1. Resistivity of chemical vapor deposited diamond films

2. Nonresonant multiphoton ionization of noble gases: Theory and experiment

3. Synchrotron-based X-ray lithography at Stanford University

4. Low-energy x-ray interaction coefficients: Photoabsorption, scattering, and reflection

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Measurement of charge carrier dynamics in diamond thin films using a fast TOF system with a UV pulsed laser;Diamond and Related Materials;2008-04

2. Development of a TOF measurement system of charge carrier dynamics in diamond thin films using a UV pulsed laser;Diamond and Related Materials;2006-11

3. Fabrication of a low-operating voltage diamond thin film metal–semiconductor–metal photodetector by laser writing lithography;Applied Physics Letters;1998-03-09

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