Germanium nitride layers prepared by supersonic r.f. plasma jet-Reference-Cited by-同舟云学术

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Germanium nitride layers prepared by supersonic r.f. plasma jet

Published:1996-01 Issue:1-3 Volume:78 Page:280-283
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Soukup L.,Peřina V.,Jastrabík L.,Šícha M.,Pokorný P.,Soukup R.J.,Novák M.,Zemek J.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference18 articles.

1. Properties of hydrogenated amorphous germanium nitrogen alloys prepared by reactive sputtering

2. ESR study on annealing behavior of reactively sputtered a-GeNx:H films

3. Thin films of amorphous germanium-carbon and germanium-nitrogen alloys prepared by activated reactive evaporation

4. High rate jet plasma-assisted chemical vapour deposition

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1. Germanium, antimony, tellurium, their binary and ternary alloys and the impact of nitrogen: An X-ray photoelectron study;Applied Surface Science;2021-01

2. Al2O3/Si0.7Ge0.3(001) & HfO2/Si0.7Ge0.3(001) interface trap state reduction via in-situ N2/H2 RF downstream plasma passivation;Applied Surface Science;2019-06

3. Influence of oxygen content on structure and material properties of reactively sputtered Al-Ge-O-N thin films;Journal of Alloys and Compounds;2018-03

4. Chalcogenide for phase change optical and electrical memories;Chalcogenide Glasses;2014

5. In-situ fabrication and characterization of ordered Ge QDs in Si3N4 matrix without barrier layers by rf-magnetron sputtering;Applied Surface Science;2014-01

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