High rate jet plasma-assisted chemical vapour deposition
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference6 articles.
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3. F.R.G. Patent Appl. DOS 3620214A1.
4. Proc. 14th Czech. Semin. on Plasma Physics Technology;Bárdoš,1987
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