Oxygen sensitivity of SrTiO3 thin film prepared using atomic layer deposition-Reference-Cited by-同舟云学术

Oxygen sensitivity of SrTiO3 thin film prepared using atomic layer deposition

Published:2009-03 Issue:2 Volume:136 Page:489-493
ISSN:0925-4005
Container-title:Sensors and Actuators B: Chemical
language:en
Short-container-title:Sensors and Actuators B: Chemical

Author:

Hara Toru,Ishiguro Takashi

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

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3. T. Hara, T. Ishiguro, N. Wakiya, K. Shinozaki, Oxygen sensitivity in perovskite-type dielectric thin films, PA20, International Conference on Science and Technology of Advanced Ceramics, 2008.

4. Effect of annealing in processing of strontium titanate thin films by ALD;Kosola;Appl. Surf. Sci.,2003

5. Deposition of LaNiO3 thin films in an atomic layer epitaxy reactor;Seim;J. Mater. Chem.,1997

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