Mechanism of in-plane alignment in magnetron sputtered biaxially aligned yttria-stabilized zirconia-Reference-Cited by-同舟云学术

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Mechanism of in-plane alignment in magnetron sputtered biaxially aligned yttria-stabilized zirconia

Published:2006-04 Issue:1 Volume:290 Page:272-279
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Mahieu Stijn,Ghekiere Pieter,Depla Diederik,De Gryse Roger,Lebedev Oleg I.,Van Tendeloo Gustaf

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference24 articles.

1. Use of ion beam assisted deposition to modify the microstructure and properties of thin films

2. Biaxially aligned YBCO film tapes fabricated by all pulsed laser deposition

3. Deposition of biaxially aligned YSZ films on inclined polycrystalline metallic substrates for YBa2Cu3O7−δ tapes

4. A model for the development of biaxial alignment in yttria stabilized zirconia layers, deposited by unbalanced magnetron sputtering

5. Influence of the Ar/O2 ratio on the growth and biaxial alignment of yttria stabilized zirconia layers during reactive unbalanced magnetron sputtering

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1. Ultraviolet/vacuum-ultraviolet emission from a high power magnetron sputtering plasma with an aluminum target;Journal of Physics D: Applied Physics;2019-11-22

2. Perspectives on oblique angle deposition of thin films: From fundamentals to devices;Progress in Materials Science;2016-03

3. Double in-plane alignment in biaxially textured thin films;Applied Physics Letters;2014-12-08

4. Origins of Texture Formation;RHEED Transmission Mode and Pole Figures;2013-12-10

5. Reactive sputter deposition of Al doped TiOx thin films using titanium targets with aluminium inserts;Journal of Alloys and Compounds;2013-11

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