Author:
Adam T.N.,Bedell S.,Reznicek A.,Sadana D.K.,Venkateshan A.,Tsunoda T.,Seino T.,Nakatsuru J.,Shinde S.R.
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference20 articles.
1. Reaction of oxygen with Si(111) and (100): critical conditions for growth of SiO2;Smith;Journal of the Electrochemical Society,1982
2. Interactions of H2O with Si(111) and (100): critical conditions for growth of SiO2;Ghidini;Journal of the Electrochemical Society,1984
3. Canon ANELVA Corporation, 3300 North First Street, San Jose, CA 95134, USA.
4. SpectraFx-100, KLA-Tencor Corporation, 1 Technology Drive, Milpitas, CA 95035, USA.
5. New mechanism for hydrogen desorption from covalent surfaces: the monohydride phase on Si(100);Sinniah;Physical Review Letters,1989
Cited by
16 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献