SiC film formation from fluorosilane gas by plasma CVD
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference11 articles.
1. Production of large‐area single‐crystal wafers of cubic SiC for semiconductor devices
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3. Deposition and characterization of amorphous and micro-crystalline Si,C alloy thin films by a remote plasma-enhanced chemical-vapor deposition process - RPECVD
4. Effect of Incident Direction of ArF Laser to Graphite Substrates on the Formation of Photo-Chemical Vapor Deposition SiC Film
5. Polycrystalline silicon carbide films deposited by low‐power radio‐frequency plasma decomposition of SiF4‐CF4‐H2gas mixtures
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