Atomic size effects on the hardness of RF sputtered Al–Cu(rich) thin films-Reference-Cited by-同舟云学术

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Atomic size effects on the hardness of RF sputtered Al–Cu(rich) thin films

Published:2004-09 Issue:1-2 Volume:270 Page:250-254
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Draissia M.,Debili M.Y.

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference7 articles.

1. M.Y. Debili, Tran Huu Loï, C. Rev. Frantz, Métall. (1998) 1501.

2. M. Draissia, M.Y. Debili, JM-EMP’2001, Algerie, 23–24 Décembre 2001.

3. M. Draissia, M.Y. Debili, Colloque Algéro-Français TAM-MAT’ 3Algérie, 23–25 février 2003.

4. V.F. Vatchev, F.F. Domenko, I. Mirotchinyenko, UDK 669.01854 Ukraine, 1990, p. 201.

5. Microstructure and mechanical properties of sputter-deposited Cu1−x Ta x alloys

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