Numerical simulation and validation of reaction mechanism for the Siemens process in silicon production
Author:
Funder
National Natural Science Foundation of China
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
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Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. A revisit from CVD kinetics to CVD reactor: Investigating uniform growth mechanism of polysilicon in a reduction furnace;Chemical Engineering Science;2024-08
2. Energy saving of 42-pair Siemens reactor with different layouts for polysilicon production: Three rings and four rings;Materials Today Communications;2024-08
3. Competitive adsorption mechanism of SiHCl3 with BCl3 under a hydrogen atmosphere: Boron impurities introduction into polysilicon;Materials Today Communications;2024-06
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