Model on transport phenomena and control of rod growth uniformity in siemens CVD reactor-Reference-Cited by-同舟云学术

Model on transport phenomena and control of rod growth uniformity in siemens CVD reactor

Published:2018-09 Issue: Volume:117 Page:351-358
ISSN:0098-1354
Container-title:Computers & Chemical Engineering
language:en
Short-container-title:Computers & Chemical Engineering

Author:

Li Xue-Gang,Xiao Wen-De

Publisher

Elsevier BV

Subject

Computer Science Applications,General Chemical Engineering

Reference28 articles.

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