Optimization of operating parameters in polysilicon chemical vapor deposition reactor with response surface methodology-Reference-Cited by-同舟云学术

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Optimization of operating parameters in polysilicon chemical vapor deposition reactor with response surface methodology

Published:2018-05 Issue: Volume:489 Page:11-19
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

An Li-sha,Liu Chun-jiao,Liu Ying-wen

Funder

National Key R&D Program of China

National Natural Science Foundation of China

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference26 articles.

1. Silicon for photovoltaic applications

2. New processes for the production of solar-grade polycrystalline silicon: A review

3. Solar grade silicon feedstock supply for PV industry

4. Development of fluidized bed reactors for silicon production

5. Analysis of the Gas Phase Reactivity of Chlorosilanes

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1. A batch preparation of large-size graphite plate/SiC coating by CVD: CFD simulation and experimental;Ceramics International;2024-05

2. Growth and defect formation mechanism of CVD-prepared SiC coatings based on cross-scale simulation;Chemical Engineering Journal;2024-01

3. Modeling and random search optimization for the polysilicon CVD reactor;Results in Control and Optimization;2023-12

4. Simulation and optimization of polysilicon thin film deposition in a 3000 mm tubular LPCVD reactor;Solar Energy;2023-03

5. Numerical Simulation Study on Flow and Heat Transfer of the Tungsten Crucible CVD Reactor;ACS Omega;2022-11-08

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