Author:
Nagano Mikinori,Mitani Takuro,Ueda Kazuaki,Zettsu Nobuyuki,Yamamura Kazuya
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference10 articles.
1. A high speed 0.6- mu m 16 K CMOS gate array on a thin SIMOX film
2. The International Technology Roadmap for Semiconductors 2006 update, Front End Process.
3. P.B. Mumola, G.J. Gardopee, T. Ferg, A.M. Ledger, P.J. Clapis, P.E. Miller, in: Proceedings of the Second International Symposium on Semiconductor Wafer Bonding Science, Technology, and Applications. 1993, p. 410.
4. Development of plasma chemical vaporization machining
5. The study of fabrication of the x-ray mirror by numerically controlled plasma chemical vaporization machining: Development of the machine for the x-ray mirror fabrication
Cited by
5 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献