Effect of InAs buffer layer thickness on physical properties of InAsBi heterostructures grown by MOCVD

Author:

Massoudi I.ORCID,Rebey A.ORCID

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference73 articles.

1. Structural and energy-gap characterization of metalorganic-vapor-phase-epitaxy-grown InAsBi;Okamoto;Jpn. J. Appl. Phys.,1999

2. Growth of metastable alloy InAsBi by low-pressure MOVPE;Okamoto;Jpn. J. Appl. Phys.,1998

3. The Bi-Se (bismuth-selenium) system;Okamoto;J. Phase Equilibria,1994

4. Lattice dynamics study of bismuth III–V compounds;Belabbes;J. Phys.: Condens. Matter,2008

5. Bismuth containing III–V quaternary alloy InGaAsBi grown by MBE;Feng;Phys. Status Solidi A,2006

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1. Nanostructured ZZO Oxides for TCO Applications: Physical, Dielectric, and Complex Impedance Spectroscopy Analysis;Arabian Journal for Science and Engineering;2024-04-18

2. The roles of Bi in InAs and InAsBi nanostructure growth;Journal of Materials Chemistry C;2024

3. Influence of the Substrate Material on the Structure and Morphological Properties of Bi Films;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2022-10

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