Gas phase nucleation of crystalline silicon and their role in low-temperature deposition of microcrystalline films during hot-wire chemical vapor deposition-Reference-Cited by-同舟云学术

Gas phase nucleation of crystalline silicon and their role in low-temperature deposition of microcrystalline films during hot-wire chemical vapor deposition

Published:2008-07 Issue:15 Volume:310 Page:3659-3662
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Lee Sung-Soo,Ko Min-Sung,Kim Chan-Soo,Hwang Nong-Moon

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference29 articles.

1. Thin-film transistors deposited by hot-wire chemical vapor deposition

2. Microcrystalline n-i-p solar cells deposited at 10Å/s by VHF-GD

3. Low temperature polycrystalline silicon: a review on deposition, physical properties and solar cell applications

4. Thin film transistors obtained by hot wire CVD

5. A 3.5in. QVGA poly-Si TFT-LCD with integrated driver including new 6-bit DAC

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