1. Dielectric Films for Advanced Microelectronics;Mikhail,2007
2. Physical and electrical characterization of Ce-HfO2 thin films deposited by thermal atomic layer deposition;King;J. Vac. Sci. Technol.,2014
3. High-K materials and metal gates for CMOS applications;Robertson;Mater. Sci. Eng. R,2015
4. Phase equilibria in the system HfO2-Y2O3-La2O3 at 1900 °C;Andrievskaya;Powder Metall. Met. Ceram.,2006
5. Hafnium oxide and it compounds with rare- earth elements (in Russian);Keller,1984