Dissociative chemisorption of molecular chlorine on Si(100) – a first principles study
Author:
Publisher
Elsevier BV
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Reference30 articles.
1. W.H. Weinberg, in: M. Grunze, H.J. Kreuzer (Eds.), Kinetics of interface reactions, Springer, Berlin, 1987, p. 94.
2. B.A. Heath, T.M. Mayer, in: N.G. Einspruch, D.M. Brown (Eds.), Plasma processing for VLSI, vol. 8 of VLSI electronics – microstructure science, Academic Press, New York, 1984, pp. 365–409.
3. Chlorine bonding sites and bonding configurations on Si(100)–(2×1)
4. Precursor and direct activated chemisorption of chlorine molecules onto silicon Si (111) (7.times.7) and Si (100) (2.times.1) surfaces
5. Mechanisms of Halogen Chemisorption upon a Semiconductor Surface: I2, Br2, Cl2, and C6H5Cl Chemisorption upon the Si(100) (2.times.1) Surface
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3. The process of dissociation of Cl2 molecule on the Ge(001)-p(1×2) surface;Applied Surface Science;2015-04
4. Chlorine Adsorption on Graphene: Chlorographene;The Journal of Physical Chemistry C;2012-11-07
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