The process of dissociative adsorption of fluorine on Ge(001) surface
Author:
Funder
University of Wrocław
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference21 articles.
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2. The Ge(001) surface;Zandvliet;Phys. Rep.,2003
3. Chemisorption and thermally activated etching of Si(100)-(2×1) by iodine;Rioux;Phys. Rev. B,1995
4. Cl2 dissociation on Si(100)-(2×1): a statistical study by scanning tunneling microscopy;Lyubinetsky;Phys. Rev. B,1998
5. First-principles molecular-dynamics calculations and STM observations of dissociative adsorption of Cl2 and F2 on Si(001);Okada;Surf. Sci.,2002
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