Effect of magnetron sputtering power on structure and properties of Ta films on Cu substrate of neutron production target for accelerator-based boron neutron capture therapy (AB-BNCT)-Reference-Cited by-同舟云学术

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Effect of magnetron sputtering power on structure and properties of Ta films on Cu substrate of neutron production target for accelerator-based boron neutron capture therapy (AB-BNCT)

Published:2024-01 Issue: Volume:219 Page:112678
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Xie Yupeng,Sun Qiuyu,Hu Yaocheng,Li Jinglun,Li Xiaobo,Jiang Quanxu,Wang Jie^ORCID,Wang Sheng^ORCID

Funder

National Natural Science Foundation of China

Xi’an Jiaotong University

Basic and Applied Basic Research Foundation of Guangdong Province

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference58 articles.

1. Accelerator-based BNCT, neutron capture therapy;Kreiner;Principles Appl.,2012

2. Simulations on the thermal and mechanical performance of the rotating target system of accelerator-driven neutron source for Boron Neutron Capture Therapy (BNCT);Hu,2023

3. Development of LINAC-based neutron source for boron neutron capture therapy in University of Tsukuba;Kumada;Plasma Fusion Res.,2018

4. Present status of the development of accelerator-based BNCT in Japan and C-BENS;Tanaka;Radioisotopes,2015

5. BINP accelerator based epithermal neutron source;Aleynik;Appl. Radiat. Isot.,2011

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