Detection of carbon contamination in EUV multilayer mirrors based on secondary electrons
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference29 articles.
1. Radiation stability of EUV Mo/Si multilayer mirrors;Benoit;Phys. B Condens. Matter,2005
2. EUV lithography: main challenges;Banine;Proc. SPIE,2004
3. In-situ non-destructive removal of tin particles by low-energy plasma for imitation of EUV optical mirrors self-cleaning;Wang;Vacuum,2023
4. Characterization of EUV induced carbon films using laser-generated surface acoustic waves;Chen;Diam. Relat. Mater.,2009
5. X-ray photoelectron spectroscopy of thin films;Greczynski;Nat Rev Methods Primers,2023
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