Chemical constitution of coatings deposited remotely by activation of hexamethyldisiloxane in positive column plasma of glow discharge in argon flow-Reference-Cited by-同舟云学术

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Chemical constitution of coatings deposited remotely by activation of hexamethyldisiloxane in positive column plasma of glow discharge in argon flow

Published:2024-03 Issue: Volume:221 Page:112858
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Zuza D.A.,Nekhoroshev V.O.^ORCID,Batrakov A.V.,Markov A.B.,Chernyavskii A.V.^ORCID,Kurzina I.A.^ORCID

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference56 articles.

1. Plasma Polymerization;Yasuda,1985

2. Where physics meets chemistry: thin film deposition from reactive plasmas;Michelmore;Front. Chem. Sci. Eng.,2016

3. Mechanisms of plasma polymerization – reviewed from a chemical point of view;Friedrich;Plasma Process. Polym.,2011

4. Organosilicon films deposited in low-pressure plasma from hexamethyldisiloxane — a review;de Freitas;Vacuum,2021

5. Plasma polymerized thiophene: molecular structure and electrical properties;S Silverstein;Polymer,2002

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1. Boosted hydrophobic properties of leather surfaces by atmospheric pressure plasma brush reactor;Vacuum;2024-04

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