Pulsed vacuum and etching systems: Theoretical design considerations for a pulsed vacuum system and its application to XeF2 etching of Si

Author:

Mousavi Arash Kheyraddini,Abbas Khawar,Elahi Mirza Mohammad Mahbube,Lima Edidson,Moya Stephen,Butner Joseph Daniel,Piñon Denise,Benga Adeeko,Mousavi Behnam Kheyraddini,Leseman Zayd Chad

Funder

Office of Basic Energy Sciences, Division of Materials Sciences and Engineering Experimental Program to Stimulate Competitive Research

National Science Foundation, USA

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference28 articles.

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2. Effect of pulsed vacuum and ultrasound osmopretreatments on glass transition temperature, texture, microstructure and calcium penetration of dried apples (Fuji);Deng;LWT – Food Sci Technol,2008

3. Survey on prevacuum high-pressure steam sterilizers;Darmady;J Clin Pathol,1964

4. Fabrication of low-stress low-stiffness leveraged cantilever beam for bistable mechanism;Wu;Microelectron Eng,2010

5. P. B. Chu, J. T. Chen, R. Yeh, G. Lin, J. C. P. Huang, B. A. Warneke, and et al, “Controlled pulse-etching with xenon difluoride,” in Proceedings of international solid state sensors and actuators conference (Transducers '97), vol. 1, pp. 665–668.

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