Investigating the plasma parameters and discharge asymmetry in dual magnetron reactive high power impulse magnetron sputtering discharge with Al in Ar/O2 mixture
Author:
Funder
National Key Research and Development Program of China
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference46 articles.
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2. Ionized physical vapor deposition (IPVD): a review of technology and applications;Helmersson;Thin Solid Films,2006
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4. Tutorial: reactive high power impulse magnetron sputtering (R-HiPIMS);Anders;J. Appl. Phys.,2017
5. Paradigm shift in thin-film growth by magnetron sputtering: from gas-ion to metal-ion irradiation of the growing film;Greczynski;J. Vac. Sci. Technol., A,2019
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