Hybrid HIPIMS+MFMS power supply for dual magnetron sputtering systems
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference42 articles.
1. A novel pulsed magnetron sputter technique utilizing very high target power densities;Kouznetsov;Surf. Coating. Technol.,1999
2. Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge;Macák;J. Vac. Sci. Technol., A,2000
3. HIPIMS power for improved thin film coatings;Ochs;Vakuum Forsch. Praxis,2008
4. Ionization of sputtered metals in high power pulsed magnetron sputtering;Bohlmark;J. Vac. Sci. Technol., A,2005
5. Evolution of the electron energy distribution and the plasma parameters in a pulsed magnetron discharge;Gudmundsson;Appl. Phys. Lett.,2001
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