Direct simulation Monte Carlo modeling of metal vapor flows in application to thin film deposition-Reference-Cited by-同舟云学术

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Direct simulation Monte Carlo modeling of metal vapor flows in application to thin film deposition

Published:2012-05 Issue:11 Volume:86 Page:1748-1758
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Venkattraman Ayyaswamy,Alexeenko Alina A.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference29 articles.

1. Thin-film deposition: principles and practice;Smith,1995

2. Thin film sensors for surface measurements;Martin,2001

3. Advances in thin film sensor technologies for engine applications;Lei,1997

4. Chemical sensors and electronic noses based on 1-d metal oxide nanostructures;Chen;IEEE Trans Nanotechnol,2008

5. Molecular gas dynamics and the direct simulation of gas flows;Bird,1994

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