The effects of impurity and temperature for transparent conducting oxide properties of Al:ZnO deposited by dc magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference28 articles.
1. Transparent conducting Al-doped ZnO thin films prepared by magnetron sputtering with dc and rf powers applied in combination
2. Effects of pulsed sputtering frequency on the uniformity of Al:ZnO’s transparent conductive oxide properties for solar cell applications
3. Fabrication and vacuum annealing of transparent conductive AZO thin films prepared by DC magnetron sputtering
4. Transparent conducting Si-codoped Al-doped ZnO thin films prepared by magnetron sputtering using Al-doped ZnO powder targets containing SiC
5. Improved optical and electrical properties of rf sputtered Al doped ZnO films on polymer substrates by low-damage processes
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4. Preparation and Structural Investigation of Ultra-Uniform Mo Films on a Si/SiO2 Wafer by the Direct-Current Magnetron Sputtering Method;Crystal Growth & Design;2023-01-09
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