Silicon films deposited on flexible substrate by hot-wire chemical-vapor deposition-Reference-Cited by-同舟云学术

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Silicon films deposited on flexible substrate by hot-wire chemical-vapor deposition

Published:2015-08 Issue: Volume:118 Page:109-112
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Tseng Ming-Chun,Horng Ray-Hua,Wuu Dong-Sing,Lien Shui-Yang

Funder

Ministry of Science and Technology, Taiwan

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference14 articles.

1. A combined experimental and computer simulation study of HWCVD nip microcrystalline silicon solar cells

2. a‐Si : H produced by high‐temperature thermal decomposition of silane

3. Catalytic Chemical Vapor Deposition (CTC-CVD) Method Producing High Quality Hydrogenated Amorphous Silicon

4. Crystallization by excimer laser annealing for a-Si:H films with low hydrogen content prepared by Cat-CVD

5. Electronic and optical properties of hot-wire-deposited microcrystalline silicon

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A simple spray assisted method to fabricate high performance layered graphene/silicon hybrid anodes for lithium-ion batteries;International Journal of Hydrogen Energy;2019-07

2. Flexible Sensors—From Materials to Applications;Technologies;2019-04-09

3. Density evaluation of remotely-supplied hydrogen radicals produced via tungsten filament method for SiCl4 reduction;Japanese Journal of Applied Physics;2018-04-04

4. High mobility single-crystalline-like silicon thin films on inexpensive flexible metal foils by plasma enhanced chemical vapor deposition;Acta Materialia;2018-04

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