Electrical and structural characterization of AlGaN/GaN field-effect transistors with recessed gate
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference14 articles.
1. www.cree.com, www.rfmd.com, www.nitronex.com, www.eudyna.com.
2. Effect of Al Composition and Gate Recess on Power Performance of AlGaN/GaN High-Electron Mobility Transistors
3. DC characteristics improvement of recessed gate GaN-based HFETs grown by MOCVD
4. DC and RF characterization of AlGaN/GaN HEMTs with different gate recess depths
5. Enhancement-Mode GaN MIS-HEMTs With n-GaN/i-AlN/n-GaN Triple Cap Layer and High- $k$ Gate Dielectrics
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1. Local increase in compressive strain (GaN) in gate recessed AlGaN/GaN MISHFET structures induced by an amorphous AlN dielectric layer;Semiconductor Science and Technology;2021-08-23
2. Crystal structures and stabilities of AlxGa1-xN and P-Type AlxGa1-xN with different Al compositions: A density functional study;Vacuum;2020-03
3. Triple tooth AlGaN/GaN HEMT on SiC substrate: A novel structure for high-power applications;Journal of the Korean Physical Society;2017-07-04
4. A novel AlGaN/GaN multiple aperture vertical high electron mobility transistor with silicon oxide current blocking layer;Vacuum;2015-08
5. Oxidation-based wet-etching method for AlGaN/GaN structure with different oxidation times and temperatures;Rare Metals;2013-10-24
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