Chemical vapor deposition of SiO2 films by TEOS/O2 supermagnetron plasma
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference8 articles.
1. SiO2 planarization technology with biasing and electron cyclotron resonance plasma deposition for submicron interconnections
2. Experimental investigation of the respective roles of oxygen atoms and electrons in the deposition of SiO2 in O2/TEOS helicon plasmas
3. High-resolution resist etching for quartermicron lithography using O[sub 2]/N[sub 2] supermagnetron plasma
4. Intermittent chemical vapor deposition of thick electrically conductive diamond-like amorphous carbon films using i-C4H10/N2 supermagnetron plasma
5. Influence of plasma heating of wafer substrates on SiO2 deposition rate in a TEOS/O2 high-density plasma CVD system
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2. Synthesis of Novel Al2O3-Mullite-cBN Composites from a Mixture of Al2O3with SiO2Nanolayer Coated cBN by Rotary CVD and Spark Plasma Sintering;Transactions of the Indian Ceramic Society;2015-07-03
3. Ultra-Low Power Poly-Si TFTs with 10 nm Stacked Gate Oxide Fabricated by Nitric Acid Oxidation of Silicon (NAOS) Method;ECS Journal of Solid State Science and Technology;2015
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