SiO2 planarization technology with biasing and electron cyclotron resonance plasma deposition for submicron interconnections
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Published:1986-07
Issue:4
Volume:4
Page:818
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Author:
Machida Katsuyuki
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
77 articles.
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