Inductively coupled RF oxygen plasma characterization by optical emission spectroscopy-Reference-Cited by-同舟云学术

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Inductively coupled RF oxygen plasma characterization by optical emission spectroscopy

Published:2007-10 Issue:2 Volume:82 Page:224-227
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Cvelbar Uroš,Krstulović Nikša,Milošević Slobodan,Mozetič Miran

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference16 articles.

1. Plasma science and technology;Boenig,1982

2. Reactive plasmas;Ricard,1996

3. Plasma sources for polymer surface treatment;Wertheimer,1998

4. Plasma sterilization. Methods and mechanisms

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