Effects of deposition parameters on the microstructure and mechanical properties of Ti(C,N) produced by moderate temperature chemical vapor deposition (MT-CVD) on cemented carbides-Reference-Cited by-同舟云学术

Effects of deposition parameters on the microstructure and mechanical properties of Ti(C,N) produced by moderate temperature chemical vapor deposition (MT-CVD) on cemented carbides

Published:2022-01 Issue: Volume:195 Page:110650
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Zhu Maoxiang^ORCID,Achache Sofiane,Boulet Pascal^ORCID,Virfeu Agathe^ORCID,Pierson Jean-François,Sanchette Frédéric

Funder

Groupement d'Intérêt Public Haute-Marne

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference45 articles.

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4. Improvement of high-temperature oxidation resistance of titanium nitride and titanium carbide films by aluminum ion implantation;Mitsuo;Surf. Coating. Technol.,1998

5. Microstructure, mechanical and thermos-physical properties of CVD TiCXN1-X coatings on cemented carbide substrates grown with C2H6 as C feeding;Kainz;Surf. Coating. Technol.,2020

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