Structural and gas barrier properties of hydrogenated silicon nitride thin films prepared by roll-to-roll microwave plasma-enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

Structural and gas barrier properties of hydrogenated silicon nitride thin films prepared by roll-to-roll microwave plasma-enhanced chemical vapor deposition

Published:2021-06 Issue: Volume:188 Page:110167
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Cho Seong-Keun,Cho Tae-Yeon,Lee Won Jae,Ryu Juwhan,Lee Jae Heung

Funder

Korea Research Institute of Chemical Technology

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference42 articles.

1. Flexible OLED displays using plastic substrates;Sugimoto;IEEE J. Sel. Top. Quant. Electron.,2004

2. Characterization of composite SiOx/polymer films deposited on pet substrates by RF reactive magnetron sputtering;Liu;Vacuum,2013

3. Investigation of the sites of dark spots in organic light-emitting devices;Liew;Appl. Phys. Lett.,2000

4. Thin film encapsulation for flexible AM-OLED: a review;Park;Semicond. Sci. Technol.,2011

5. Development of high barrier films on flexible polymer substrates;Charton;Thin Solid Films,2006

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Substrate-dependent structural evolution during the oxidation of SiNx thin films;Journal of Materials Science;2024-05-18

2. Simple Encapsulation Method for Flexible Perovskite Solar Cells with Transparent Electrode‐Integrated Barrier Films;Solar RRL;2024-05-12

3. Advances in surface modification and functionalization for tailoring the characteristics of thin films and membranes via chemical vapor deposition techniques;Journal of Applied Polymer Science;2023-02-23

4. Design and preparation of high-transmittance broadband antireflection coatings with tailored refractive indices deposited by PECVD;Vacuum;2023-02

5. Improving Stability of Roll-to-Roll (R2R) Gravure-Printed Carbon Nanotube-Based Thin Film Transistors via R2R Plasma-Enhanced Chemical Vapor-Deposited Silicon Nitride;Nanomaterials;2023-01-30