Surface roughness of hydrogen silsesquioxane as a negative tone electron beam resist
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference33 articles.
1. Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations
2. Sub-10 nm Linewidth and Overlay Performance Achieved with a Fine-Tuned EBPG-5000 TFE Electron Beam Lithography System
3. Hydrogen silsesquioxane/novolak bilayer resist for high aspect ratio nanoscale electron-beam lithography
4. Nano-patterning of a hydrogen silsesquioxane resist with reduced linewidth fluctuations
5. HSQ hybrid lithography for 20 nm CMOS devices development
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