Effect of NH3 plasma treatment on the device performance of ZnO based thin film transistors
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference28 articles.
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2. Improved reliability of a-IGZO thin-film transistor under positive gate bias stress by utilizing NH3 plasma treatment;Microelectronics Reliability;2023-12
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4. Synthesis and characterization of undoped and strontium doped ZnO thin films;Materials Today: Proceedings;2022
5. Combined effects of NH3 and NF3 post plasma treatment on the performance of spray coated ZnO thin film transistors;Solid-State Electronics;2021-12
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