Adhesion of hydrogenated amorphous carbon films on ferrous alloy by intermediate nitrogen plasma treatment in silicon-containing interlayers-Reference-Cited by-同舟云学术

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Adhesion of hydrogenated amorphous carbon films on ferrous alloy by intermediate nitrogen plasma treatment in silicon-containing interlayers

Published:2019-09 Issue: Volume:167 Page:21-27
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Boeira Carla D.,Leidens Leonardo M.,Crespi Ângela E.,Maia da Costa Marcelo E.H.,Figueroa Carlos A.,Michels Alexandre F.

Funder

UCS, INCT-INES

FAPERGS and Plasmar Tecnologia Ltda

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference41 articles.

1. Protective double-layer coatings prepared by plasma enhanced chemical vapor deposition on tool steel;Mureşan;Surf. Coating. Technol.,2015

2. Nitrogen incorporation into hard amorphous carbon films obtained by RF plasma decomposition of CH4-N2 gas mixtures;Freire;Phys. Status Solidi,1995

3. Effect of film thickness and interlayer on the adhesion strength of diamond like carbon films on different substrates;Wei;Diam. Relat. Mater.,2007

4. Mechanical stability of DLC films on metallic substrates Part II — interfacial toughness, debonding and blistering;Peng;Thin Solid Films,1998

5. DLC films grown on steel using an innovator active screen system for PECVD technique;da Silva;Mater. Res.,2016

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1. Visual UV-sensitive colorimetric film deposited by PECVD;Materials Chemistry and Physics;2024-09

2. Effects of N doping on mechanical properties of Fe and interlayer adhesion of Fe with Cr, Ti, and Si: A spin-polarized density functional theory study;Journal of Applied Physics;2023-11-01

3. Anti-corrosion and erosion properties of multilayers with diamond-like carbon and silicon films deposited on low-carbon steel;Radiation Physics and Chemistry;2023-06

4. Visual Uv-Sensitive Colorimetric Film Deposited by Pecvd;2023

5. Surface morphology and chemical microstructure of glow discharge polymer films prepared by plasma enhanced chemical vapor deposition at various Ar/H2 ratios;Vacuum;2022-08

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