Selection of metal ion irradiation for controlling Ti1−xAlxN alloy growth via hybrid HIPIMS/magnetron co-sputtering
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference24 articles.
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1. Structural, Mechanical, Tribological, and Electrochemical Behavior of Ti1−xAlxN Coatings Deposited by High-Power Impulse Magnetron Sputtering from a Single Ti/Al Target;Journal of Materials Engineering and Performance;2024-06-03
2. Effect of pulsed electric field on the nanocrystalline growth of magnetron-sputtered TiAlN hard coatings;Ceramics International;2024-01
3. Characteristics of high-power impulse magnetron sputtering (HiPIMS) deposited nanocomposite-TiAlSiN coating under variable pulse frequencies;Vacuum;2024-01
4. In-situ monitoring of stress evolution in high power impulse magnetron sputtering-deposited Ti-Al-N films: Effect of substrate bias and temperature;Thin Solid Films;2023-11
5. Improving the crystallinity and texture of oblique-angle-deposited AlN thin films using reactive synchronized HiPIMS;Surface and Coatings Technology;2023-09
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