Optical, electrical and structural characteristics of Al:ZnO thin films with various thicknesses deposited by DC sputtering at room temperature and annealed in air or vacuum-Reference-Cited by-同舟云学术

Optical, electrical and structural characteristics of Al:ZnO thin films with various thicknesses deposited by DC sputtering at room temperature and annealed in air or vacuum

Published:2010-03 Issue:7 Volume:84 Page:924-929
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Guillén C.,Herrero J.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference31 articles.

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4. Magnetron sputtering of transparent conductive zinc oxide: relation between the sputtering parameters and the electronic properties;Ellmer;J Phys D Appl Phys,2000

5. Influence of deposition conditions on the thermal stability of ZnO: Al films grown by rf magnetron sputtering;Haug;J Vac Sci Technol A,2001

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