The effect of hole density variation in the PECVD reactor showerhead on the deposition of amorphous carbon layer
Author:
Funder
Samsung
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference25 articles.
1. 22nm half-pitch patterning by CVD spacer self alignment double patterning (SADP);Bencher;Proc. SPIE,2008
2. Hard mask and lithographic capabilities improvement by amorphous carbon step coverage optimization in high aspect ratio device pattern;Lai;Vacuum,2018
3. The grand challenges of plasma etching: a manufacturing perspective;Lee;J. Phys. D Appl. Phys.,2014
4. Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfide;Kim;J. Vac. Sci. Technol., A,2013
5. Generating sub-30-nm polysilicon gates using PECVD amorphous carbon as hardmask and anti-reflective coating;Liu;Proc. SPIE,2003
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