Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfide-Reference-Cited by-同舟云学术

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Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfide

Published:2013-03 Issue:2 Volume:31 Page:021301
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Kim Jong Kyu,Cho Sung Il,Kim Nam Gun,Jhon Myung S.,Min Kyung Suk,Kim Chan Kyu,Yeom Geun Young

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4780122

Cited by 30 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigation of the removal mechanism in amorphous carbon chemical mechanical polishing for achieving an atomic-scale roughness;Applied Surface Science;2024-10

2. Precise and practical 3D topography simulation of high aspect ratio contact hole etch by using model optimization algorithm;Journal of Vacuum Science & Technology A;2024-06-10

3. Surface sulfurization of amorphous carbon films in the chemistry of oxygen plasma added with SO2 or OCS for high-aspect-ratio etching;Applied Surface Science;2024-02

4. Role of Oxygen in Amorphous Carbon Hard Mask Plasma Etching;ACS Omega;2023-08-31

5. Individual Effects of Various Plasma-Related Factors on the High Aspect Ratio Oxide Etching Process at Low-Frequency Bias Power Using an Inductively Coupled Plasma System;Plasma Chemistry and Plasma Processing;2023-08-08

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