Effect of annealing in oxidizing atmosphere on optical and structural properties of silicon suboxide thin films obtained by gas-jet electron beam plasma chemical vapor deposition method-Reference-Cited by-同舟云学术

Effect of annealing in oxidizing atmosphere on optical and structural properties of silicon suboxide thin films obtained by gas-jet electron beam plasma chemical vapor deposition method

Published:2018-06 Issue: Volume:152 Page:319-326
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Zamchiy A.O.,Baranov E.A.,Merkulova I.E.,Volodin V.A.,Sharafutdinov M.R.,Khmel S.Ya.

Funder

Russian Science Foundation

SB RAS

Ministry of Education and Science of the Russian Federation

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

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