Standard AZ 5214E photoresist in laser interference and EBDW lithographies-Reference-Cited by-同舟云学术

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Standard AZ 5214E photoresist in laser interference and EBDW lithographies

Published:2015-01 Issue: Volume:111 Page:5-8
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Škriniarová J.,Andok R.,Pudiš D.,Benčurová A.,Nemec P.,Šušlik L.

Funder

Slovak Academy of Sciences

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference22 articles.

1. Clariant product datasheet for the AZ 5214E photoresist.

2. Resist profile control of image reversal progess in contact lithography;Pommereau;Microelectron Eng,1989

3. Towards an optimized image reversal process for half micron lithography;Reuhman-Huisken;Microelectron Eng,1989

4. An optimized image reversal process for half-micron lithography;Reuhman-Huisken;Microelectron Eng,1990

5. Diffusion in AZ-5214 image reversal process and its application to e-beam proximity effect correction;Liu;Microelectron Eng,1987

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Two-photon nanolithography of positive photoresist of AZ 5214E with a spatial resolution at nanoscale;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-03-02

2. Nanobridges formed through electron beam image reversal lithography for plasmonic mid-infrared resonators with high aspect ratio nanogaps;Nanotechnology;2019-08-06

3. Lithographic technologies suitable for PhC patterning and optical properties of patterned LED surfaces;Optik;2017-08

4. Investigation of the AZ 5214E photoresist by the laser interference, EBDW and NSOM lithographies;Applied Surface Science;2017-02

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