Investigation of the AZ 5214E photoresist by the laser interference, EBDW and NSOM lithographies-Reference-Cited by-同舟云学术

Investigation of the AZ 5214E photoresist by the laser interference, EBDW and NSOM lithographies

Published:2017-02 Issue: Volume:395 Page:226-231
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Škriniarová J.,Pudiš D.,Andok R.,Lettrichová I.,Uherek F.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference19 articles.

1. Fabrication of holographic photonic crystal template with back incident interference beams;Liu;Proc. SPIE,2005

2. Fabricating three-dimensional polymeric photonic structures by multi-beam interference lithography;Moon;Polym. Adv. Technol.,2006

3. Clariant Product Datasheet for the AZ 5214E image-reversal photoresist, Clariant GmbH, Rheingaustrasse 190 D-65203 Wiesbaden, Germany. http://www.microchemicals.com/micro/az_5214e.pdf.

4. Mechanism and lithographic evaluation of image reversal in AZ 5214 photoresist;Spak;AZ Electron. Mater.,2000

5. Diffusion in AZ-5214 image reversal process and its application to e-beam proximity effect correction;Liu;Microelectron. Eng.,1987

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electron-Beam Direct Writing-Based High-Performance Graphene Electrode Fabrication;ACS Applied Electronic Materials;2023-09-05

2. Two-photon nanolithography of positive photoresist of AZ 5214E with a spatial resolution at nanoscale;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-03-02

3. Enhanced frequency up-conversion based on four-wave mixing assisted by a Bessel-Gaussian beam in 85Rb atoms;Optics & Laser Technology;2022-05

4. Image Reversal Resist Photolithography of Silicon-Based Platinum and Silver Microelectrode Pattern;Sains Malaysiana;2021-02-28

5. 多光束全息干涉法制作复式光子晶体的数值仿真研究;Acta Optica Sinica;2021