Near-field optical mapping of the ion-implanted patterns fabricated in amorphous silicon carbide-Reference-Cited by-同舟云学术

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Near-field optical mapping of the ion-implanted patterns fabricated in amorphous silicon carbide

Published:2005-07 Issue:1-2 Volume:79 Page:94-99
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Tsvetkova T.,Takahashi S.,Zayats A.,Dawson P.,Turner R.,Bischoff L.,Angelov O.,Dimova-Malinovska D.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference23 articles.

1. Physics of Amorphous Silicon–Carbon Alloys

2. Amorphous and crystalline silicon carbide;Powell,1989

3. Amorphous and microcrystalline semiconductor devices,1991

4. SiC thin-film thermistor

5. Ion implantation and ion beam processing of materials;Hirvonen,1984

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