Effect of target grain size on target sputter etching morphology and performance
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference24 articles.
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2. Comparative study of Cu films prepared by DC, high-power pulsed and burst magnetron sputtering;Solovyev;J. Electron. Mater.,2016
3. The influence of pressure and magnetic field on the deposition of epitaxial TiBx thin films from DC magnetron sputtering;Nedfors;Vacuum,2020
4. Comparative study of discharge characteristics and associated film growth for post-cathode and inverted cylindrical magnetron sputtering;Rane;Pramana - J. Phys.,2019
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