Effects of deposition precursors of hydrogenated amorphous carbon films on the plasma etching resistance based on mass spectrometer measurements and machine learning analysis-Reference-Cited by-同舟云学术

Effects of deposition precursors of hydrogenated amorphous carbon films on the plasma etching resistance based on mass spectrometer measurements and machine learning analysis

Published:2022-11 Issue: Volume:205 Page:111351
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Kurokawa Jumpei,Kondo Hiroki^ORCID,Tsutsumi Takayoshi,Ishikawa Kenji,Sekine Makoto,Hori Masaru

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

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